apo alakai i uhi ia TaC

Hoʻolālā ʻia ʻo Semixlab's TaC Coated Guide Ring me ka pololei a me ka hana i ka noʻonoʻo, i hoʻolālā ʻia e kū i nā kūlana koʻikoʻi o nā kaiapuni hana semiconductor kiʻekiʻe a me ka corrosive. Ke hoʻohana nei i ka CVD TaC Coating kiʻekiʻe (Chemical Vapor Deposition of Tantalum Carbide), hāʻawi kēia ʻāpana i ka lōʻihi like ʻole, ke kūpaʻa wela, a me ke kūpaʻa kemika.

Ma ke ʻano he TaC Coated Guide Ring Manufacturer i hilinaʻi ʻia, hāʻawi ʻo Semixlab i nā hoʻonā i hoʻopaʻa ʻia e hōʻoiaʻiʻo i ka hoʻohālikelike ʻana me nā ʻōnaehana hana wafer. Inā paha i kapa ʻia ʻo TaC Coated Diversion Ring, TaC alakaʻi apo, a i ʻole CVD TaC apo, he mea koʻikoʻi kēia ʻāpana no ka mālama ʻana i ka alignment wafer a me ke kahe like ʻana i ka diffusion a me nā noi epitaxy.

Ⅰ. Hoʻohui Mea a me ka uhi ʻili

ʻO ke kumu o nā apo alakaʻi Semixlab ka mea maʻamau i haku ʻia me ka graphite maʻemaʻe kiʻekiʻe a i ʻole silicon carbide (SiC), i koho ʻia no kona kūpaʻa ʻana a me ka conductivity thermal. Hoʻopili ʻia ka ʻili me kahi ʻāpana like ʻole o Tantalum Carbide (TaC) ma o ke kaʻina hana CVD pololei, e hana ana i kahi pale paʻakikī, paʻakikī, a paʻakikī hoʻi i ka ʻaʻahu, hoʻouka kemika, a me ka hoʻohaʻahaʻa wela.

Nā hiʻohiʻona nui o ka CVD TaC Coating:

● Kiʻekiʻe hehee wale (~3880°C).

● Kū'ē maikaʻi i ka HF, HCl, a me nā kinoea kaʻina hana ʻē aʻe.

● ʻO ka paʻakikī (Mohs 9–10).

● ʻOi aku ka maikaʻi o ka hoʻoheheʻe ʻana i nā ʻāpana.

Ⅱ. No ke aha e koho ai iā Semixlab?

Kūʻē ʻo Semixlab ma waena o nā mea hoʻolako apo alakaʻi i uhi ʻia e TaC ma o ka hāʻawi ʻana:

● Nā lawelawe hoʻolālā i hoʻonohonoho pono ʻia e hoʻohālikelike i nā kumu hoʻohālike like ʻole.

● ʻO ka ʻae ʻana i nā ʻāpana ʻokoʻa no ka hoʻohui pono ʻana.

● Kaiapuni hana haʻahaʻa-particle e hōʻoia ana i ka maʻemaʻe a me ka maʻemaʻe.

Hoʻopili pū kā mākou hui me nā ʻenekini kaʻina hana semiconductor e hoʻomohala pū i nā hoʻonā Semixlab Guide Ring no nā laina hana kiʻekiʻe. Hoʻomaʻamaʻa koʻikoʻi kēlā me kēia huahana e hōʻoia i ka kūlike o ka uhi ʻana a me ka pololei o ke kūkulu ʻana ma mua o ka lawe ʻana.

Nā noi ma ka hana semiconductor

1. Plasma Etching – Ka Hoomalu ana i ka Wafer Integrity Ma lalo o Reactive Plasma Environments

Ma nā kaʻina hana etching plasma kiʻekiʻe, kahi e hōʻike ʻia ai nā wafers i nā plasmas ikaika a me nā kemika kinoea reactive (e like me CF₄, SF₆, Cl₂, a me BCl₃), he hana koʻikoʻi ka TaC Coated Guide Ring:

hoʻopaʻa a hoʻopaʻa i ka mea lawe wafer a i ʻole susceptor, e pale ana i ka misalignment a i ʻole ka haʻalulu e hiki ke hoʻopilikia i ka etch precision.

ʻO ka mea nui aʻe, ʻo ka CVD-deposited Tantalum Carbide coating i hoʻokumu ʻia i kahi pale chemically inert e kūʻē i ka corrosion a me ka erosion e nā ʻano plasma reactive. Mālama kēia i ka hoʻohaʻahaʻa ʻana i ka waiwai a hoʻopau i ka hoʻokahe ʻana i nā ʻāpana, ʻo ia ke kumu nui o ka micro-contamination a me ka nalowale o nā hua.

2. ʻO ka hoʻoheheʻe ʻia ʻana o ka mahu (CVD) a me ka waiho ʻana o ka mahu kino (PVD) - e hōʻoia i ka hoʻokumu ʻana i ke kiʻiʻoniʻoni lahilahi.

Ma nā kaʻina hana CVD a me PVD, pono ka mālama ʻana i ka wela a me ka hoʻomaʻemaʻe kemika no ka hoʻokō ʻana i ka deposition kiʻiʻoniʻoni lahilahi kiʻekiʻe. I loko o kēia mau ʻanuʻu, kōkua ke apo alakaʻi i ka hoʻonohonoho pono ʻana i ka ʻōnaehana kākoʻo wafer a hōʻoia i ka hāʻawi like ʻana o ke kahe kinoea ma luna o ka ʻili wafer.

ʻO ka uhi ʻana o TaC, me kona wahi hoʻoheheʻe kiʻekiʻe loa (~ 3880 ° C) a me ka haʻahaʻa haʻahaʻa me nā kinoea precursor, e mālama i ka pololei o ka hoʻolālā ʻana ma lalo o ke kaʻa kaʻa wela a me nā kūlana vacuum kiʻekiʻe. ʻAʻole like me ka graphite a i ʻole nā ​​ʻāpana metala ʻole, ʻaʻole ia e ʻae a hoʻopaʻa ʻia i nā kinoea kaʻina hana, he mea koʻikoʻi ia i ka pale ʻana i ka haumia kemika.

Nā Pōmaikaʻi Nui ma CVD/PVD:

● Kāohi distortion a dimensional drift i ka wā kiʻekiʻe-mehana kiʻiʻoniʻoni ulu.

● E hōʻoia i kahi kaʻina hana maʻemaʻe ma ka pale ʻana i ka outgassing a i ʻole ka pilina kemika.

● Hoʻonui i ka like ʻana o ka waiho ʻana ma waena o nā wafers 200mm a me 300mm.

● He kūpono no ka waiho ʻana i nā kiʻiʻoniʻoni kiʻiʻoniʻoni e like me SiN, SiO₂, Al₂O₃, TiN, a me nā papa pale.