Pale Hea Quartz
ʻO ka Quartz Heat Shield, i hana ʻia mai ka quartz keʻokeʻo keʻokeʻo, he mea hoʻonaninani wela kiʻekiʻe i hoʻolālā ʻia no nā lako epitaxy SiC. Hoʻolālā ʻia e hana i loko o nā kaiapuni ultra-kiʻekiʻe (a hiki i 1700 ° C), hoʻemi maikaʻi kēia pale wela i ka hoʻololi ʻana i ka wela radiative a me ka conductive e hoʻomaikaʻi ʻia i kona ʻano ʻōhū kūloko a me nā palena palaoa.
Description
ʻO ka Quartz Heat Shield, i hana ʻia me ka quartz keʻokeʻo keʻokeʻo, he ʻāpana hoʻokele wela kiʻekiʻe i hana ʻia no ka hoʻohana ʻana i nā ʻōnaehana epitaxy SiC kiʻekiʻe. Hoʻohālikelike ʻia me ka quartz transparent, hāʻawi kēia mea i ka insulation ʻoi aku ka maikaʻi, hoʻomaikaʻi i ka paʻa o ke kaʻina hana, a ʻoi aku ka maikaʻi o ke kumu kūʻai - e lilo ia i mea kūpono no ka pale wela ma MOCVD a me nā keʻena pane CVD.
Ⅰ. Hoʻohui Mea a me nā ʻano kino kino
● Mea: Milky white quartz (synthetic fused silica with dispersed microbubbles and grain boundaries)
● Ke kala a me ka helehelena: Translucent keʻokeʻo
● Hoʻoheheʻe Thermal: ʻOi aku ka haʻahaʻa ma mua o ka quartz alohilohi ma muli o ke ʻano o ka ʻōpū o loko
● Ka Mahana Hana: Paʻa a hiki i 1700°C
● Koefficient Hoonui wela: ~0.55 × 10⁻⁶ /K (like me ka quartz alohilohi)
● Kiekie Thermal Shock Resistance
● Maʻemaʻe Kemika maikaʻi loa: E mālama i nā mea haumia (e laʻa, Al, Na) ma lalo o 1 ppm
Ⅱ. Nā Hana Koʻikoʻi ma nā polokalamu SiC Epitaxy
Ua koho pono ʻia ka quartz keʻokeʻo Milky no nā reactors epitaxial SiC ma muli o kēia mau pono koʻikoʻi:
(1) Hoʻonui i ka hana ʻana o ka hoʻoheheʻe wela
ʻO ka hoʻopuehu ʻana i ka hoʻoheheʻe ʻana i ka infrared: Hoʻopuehu nā ʻōpū o loko a me nā palena o ka palaoa i nā manawa he nui. Hāʻawi ʻo 30-50% ʻoi aku ka maikaʻi ma mua o ka quartz transparent ma lalo o nā kūlana 1500-1700 ° C.
Haʻahaʻa Thermal Conductivity: Hoʻemi ka microbubble puʻupuʻu i ka nalo wela conductive, e hoʻonui ana i ka pono wela.
(2) Paʻa a me ke kūpaʻa kiʻekiʻe
ʻO ke kū ʻana o ka puʻu wela: ʻOiai e kaʻana like ana i ka helu hoʻonui like me ka quartz maʻemaʻe, kōkua kāna microstructure e hoʻomoʻa i ke koʻikoʻi wela kūloko - kūpono no nā kaʻina hana wikiwiki.
Kū'ē Crystallization: Ma nā ea hoʻohaʻahaʻa kiʻekiʻe (e laʻa, H₂), ʻoi aku ka paʻa o ka quartz milky i ka devitrification i loko o ka α-cristobalite, e hōʻemi ana i ka pōʻino o ka haki.
(3) Hoʻohālikelike kaʻina hana a me ka Mana Deposition
Hoʻemi ʻia ʻo Parasitic Deposition: ʻO kona opacity e hoʻemi i ka wela nui kūloko, kahi e pale ai i ka decomposition mua o nā precursors (e laʻa, SiH₄, C₃H₈) ma luna o ka pale.
Kūlana Kūlana Kūlike: Hoʻolaha ka hoʻopuehu ʻana i ka hāʻawi ʻana i ka mahana ma waena o ka wahi pane, koʻikoʻi no ka hoʻokō ʻana i ka like ʻana o ka papa epitaxial i nā mea mana SiC.
(4) Kūʻai-Elele
Kumukūʻai haʻahaʻa haʻahaʻa: ʻoi aku ka maʻalahi o ka quartz keʻokeʻo Milky ma mua o ka quartz transparent ultra-high-purity, e kūpono ana ia ma ke ʻano he mea hoʻohana ʻia i ka mea pale wela.
(5) Maintenance & Noonoo
Hoʻomaʻemaʻe Maʻemaʻe: E hōʻoia i nā pae haumia haʻahaʻa loa (Al, Na <1 ppm) e pale i ka hoʻohaumia ʻana o ka ʻili epitaxial SiC.
Hoʻokele Ola: Ma hope o ka hoʻohana lōʻihi ʻana (maʻamau ma mua o 1000 mau hola), hiki ke hoʻohaʻahaʻa ka microbubble coalescence i ka hana wela—pono ke hoʻololi maʻamau.
noi
Nā Typical Applications
✔SiC MOCVD a me CVD reactors
✔Epitaxial ulu o SiC mana semiconductors
✔ ʻO ka diffusion kiʻekiʻe-mehana a me nā keʻena deposition
✔Ka pale wela wela i loko o nā wahi ʻea kinoea
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