Pa'a Po'i 'o TaC

Hana ʻia ka Semixlab TaC Coated Rotation Plate no ka wela wela a me ka corrosive kaiapuni i ʻike pinepine ʻia i ka semiconductor epitaxy, CVD, a me nā kaʻina ulu kristal. He kuleana koʻikoʻi kēia mau papa rotation i ke kākoʻo ʻana i nā mea lawe wafer a i ʻole nā ​​​​susceptors i ka wā o ka hoʻololi ʻana o ka substrate, e hōʻoiaʻiʻo ana i ka hāʻawi ʻana i ka wela a me ka waiho ʻana. Ma ka hoʻohana ʻana i kahi uhi tantalum carbide (TaC), loaʻa kēia ʻāpana i ke kūpaʻa kūʻokoʻa, ke kūpaʻa wela, a me ke kaʻina hana lōʻihi i ke koi ʻana i nā noi semiconductor kiʻekiʻe.

ʻO Semixlab's Customization & Support Services

● Ka mānoanoa a me ka Geometry

Inā no ka 200mm, 300mm, a i ʻole nā ​​papa hoʻololi hoʻololi ʻia, hāʻawi ka hui o Semixlanb i nā hoʻonā hoʻonā TaC coating geometry-specific i kūpono i kāu kaʻina hana.

● Kūkākūkā Koho Mea

Pono e kōkua i ka hoʻoholo ʻana ma waena o ka graphite, SiC, a i ʻole quartz substrates? Ke kōkua nei kā mākou mau ʻenekini i ke koho ʻana i ka mea kumu kūpono no kāu uhi TaC.

● Hoʻolaha wikiwiki a me nā lawelawe pūʻulu liʻiliʻi

He kūpono no ka R&D a me ka hana hoʻokele, kākoʻo ʻo Semixlab i nā kauoha haʻahaʻa-MOQ me nā manawa alakaʻi pōkole.

● Kākoʻo ma hope o ke kūʻai aku

Mai ke alakaʻi hoʻonohonoho ʻana i ka uhi ʻana i ka hoʻokō ʻana, hōʻoia kā mākou hui loea e loaʻa iā ʻoe ka waiwai lōʻihi a me ka hilinaʻi mai kēlā me kēia mea a mākou e hāʻawi ai.

● SiC a me GaN Epitaxial Growth

● Metala Organic Chemical Vapor Deposition (MOCVD)

● Haʻahaʻa/Kiʻekiʻe Ka Hoʻopaʻa ʻana i ka mahu (LPCVD / HPCVD)

● Sapphire a me SiC Crystal Growth Furnaces

● Nā Keʻena Hoʻoponopono Kiʻiʻoniʻoni Kiʻekiʻe

silika carbide epitaxial ulu kapuahi a me na mea pono

Ma ke ʻano he alakaʻi alakaʻi TaC Coated Rotation Plate a me ka mea hoʻolako ma Kina, Me ka ʻike hohonu o ka ʻoihana, ka ʻenehana hoʻopili pololei, a me ka paʻa ikaika i ka hana hou, hāʻawi ʻo Semixlab i nā mea i uhi ʻia ʻo TaC e kū ana i nā kūlana koʻikoʻi o ka ʻoihana semiconductor. Manaʻolana mākou e lilo i hoa noho lōʻihi ma Kina.

Nā Pono Kino Nui a me nā Pono Hana

1. Kūʻokoʻa Thermal Kūʻokoʻa

He helu heheʻe ko TaC ma mua o 3880°C, e hoʻopaʻa paʻa loa ana ka pā hoʻololi i uhi ʻia i ka wā o ka hana ʻana i ka wela kiʻekiʻe.

He mea koʻikoʻi kēia ʻano wela wela no nā ʻōnaehana MOCVD, LPCVD, a me PVD, kahi e hōʻike ʻia ai nā substrate i ka fluctuating a me nā wela wela.

2. ʻOi aku ka maikaʻi ʻole o ke kino

ʻO ka Tantalum carbide ka mea kemika i nā kinoea koʻikoʻi loa a me nā huahana corrosive, me ka chlorine, hydrogen, a me nā mea halogenated.

ʻO kēia kūpaʻa kemika e hōʻoia i ka hana lōʻihi a me ka hōʻemi ʻana i nā pōʻino contamination, koʻikoʻi no ka SiC epitaxy, GaN deposition, a me ka ulu kiʻiʻoniʻoni oxide.

3. Paʻa Paʻa a me ka ʻErosion Kūʻē

Me ka paʻakikī o Vickers ma luna o 2000 HV, pale ka ʻili i uhi ʻia ʻo TaC i ka ʻaʻahu mechanical mai nā mīkini ʻōwili a me ka hopena ʻāpana.

Hoʻololi ʻia ka pōmaikaʻi i ke ola lawelawe lōʻihi a me ke alapine hoʻololi haʻahaʻa, e hōʻemi ana i ka downtime mālama i ka hana semiconductor
laina.

4. Hoʻohui maikaʻi i ka uhi ʻana a me ka hoʻopili

ʻO ke kaʻina hana hoʻopili CVD ponoʻī o Semixlab e hōʻoiaʻiʻo i nā papa TaC paʻa, ʻaʻahu, a paʻa maikaʻi, pono ia no nā hopena kaʻina hana like ʻole a me ka hana liʻiliʻi.