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Ka uhi ʻana o CVD Silicon Carbide (SiC).

Ka uhi ʻana o CVD Silicon Carbide (SiC).

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SiC Coated Graphite Susceptor
SiC Coated Graphite Susceptor

SiC Coated Graphite Susceptor


ʻO Semixlab's SiC coated graphite susceptors nā mea hana kiʻekiʻe i hoʻolālā ʻia no nā kaʻina wela kiʻekiʻe e like me ka semiconductor epitaxial deposition a me MOCVD. Hoʻohana lākou i kahi substrate graphite maʻemaʻe kiʻekiʻe i uhi ʻia me kahi papa silicon carbide (SiC) ʻeleʻele, kemika inert ma o ke kaʻina CVD. Hāʻawi kēia mau susceptors i ka hoʻohālikelike wela maikaʻi loa, pale maikaʻi i ka hoʻohaumia ʻana i nā ʻāpana, a hoʻomaikaʻi nui i ka lōʻihi o nā mea. ʻO ke koho ʻana i kā mākou mau mea kōkua hiki ke kōkua iā ʻoe e hoʻomaikaʻi i ka hopena o ke kaʻina hana a hoʻemi i nā kumukūʻai mālama. Manaʻo mākou i ka lohe ʻana mai iā ʻoe.

Description

ʻO ka SiC (Silicon Carbide) coated graphite susceptor he mea koʻikoʻi ia no ka hana semiconductor, ʻoiai ke koi ʻana i nā noi wela kiʻekiʻe e like me ka epitaxial deposition a me MOCVD (Metal-Organic Chemical Vapor Deposition).

Hoʻolālā ʻia kēia mau susceptors e hoʻopaʻa a hoʻomehana i nā wafer silika me ka pololei ʻokoʻa, e hōʻoia ana i ka hāʻawi ʻana i ka mahana like ʻole a me kahi kaʻina hana maʻemaʻe. He mea koʻikoʻi kā mākou susceptors no ka hana ʻana i nā kiʻi ʻoniʻoni ʻoniʻoni kiʻekiʻe, ʻo ia ke kumu o nā mea hana semiconductor hilinaʻi a kiʻekiʻe.

Ⅰ. Nā Mea Koʻikoʻi a me nā waiwai kī

Hoʻokumu ʻia kā mākou susceptors me ka hoʻohana ʻana i ka graphite core maʻemaʻe kiʻekiʻe a me kahi papa pale o Silicon Carbide (SiC).

Kiʻekiʻe-Maʻemaʻe Graphite: Hāʻawi ka graphite substrate i ka paʻa paʻa kumu a me ka hana wela. ʻO kona kūpaʻa wela maikaʻi e hiki ai ke hana i nā wela kiʻekiʻe loa me ka ʻole deformation. ʻO ka haʻahaʻa wela haʻahaʻa o ka graphite e hiki ai i ka hoʻomehana wikiwiki a me ka maikaʻi, he mea nui ia no nā manawa pōʻai wikiwiki i kahi kaiapuni hana.

Ka uhi ʻana o Silicon Carbide (SiC): Hoʻopili ʻia ka uhi SiC i ka graphite ma o ke kaʻina CVD (Chemical Vapor Deposition). Hoʻokumu kēia i kahi ʻili paʻa, ʻaʻole porous i paʻakikī loa a inert kemika. Hāʻawi ʻo SiC i ke kūpaʻa kiʻekiʻe i ka erosion plasma a me ka hoʻouka ʻana mai nā kinoea kaʻina hana koʻikoʻi, ka pale ʻana i ka ʻinoʻino a me ka hoʻokumu ʻana o nā ʻāpana. Mālama kēia i kahi kaʻina hana maʻemaʻe, hoʻolōʻihi i ke ola o ka mea, a pale i ka graphite lalo mai ka pōʻino.

Ⅱ. Nā Pōmaikaʻi Hana ma ka Hana Wafer

He kuleana koʻikoʻi kā mākou mau mea hoʻopiʻi graphite uhi SiC i ka hōʻoia ʻana i ka maikaʻi a me ka pono o ka hana semiconductor.

● Kaulike wela like ole: ʻO ka hoʻolālā o ka susceptor, i hui pū ʻia me nā waiwai wela o SiC a me ka graphite, e hōʻoia i ka puʻunaue like ʻana o ka wela ma ka ʻili wafer holoʻokoʻa. He mea koʻikoʻi kēia no ka loaʻa ʻana o ka mānoanoa kiʻiʻoniʻoni like ʻole a me nā waiwai waiwai kūpono, ʻo ia ke kī i ka hua kiʻekiʻe.

● ʻOi aku ka mana hoʻohaumia: ʻO ka pale SiC non-porous a me ke kemika inert e pale i ka hoʻokuʻu ʻana a me ka hoʻoheheʻe ʻana mai ka substrate graphite. ʻO kēia ka mea e hōʻemi nui ai i ka pilikia o ka hoʻohaumia ʻana o ka wafer a me nā hemahema, kahi paʻakikī maʻamau i nā kaʻina hana wela kiʻekiʻe.

● Hoʻonui i ka lōʻihi a me ke ola: Hana ʻia ka pale SiC paʻa ma ke ʻano he pale pale e kūʻē i nā mea abrasive a me ka corrosive, e hoʻonui nui i ke ola o ka susceptor. Hoʻemi kēia i ke alapine o ka hoʻololi a hoʻohaʻahaʻa i nā kumukūʻai mālama holoʻokoʻa.

● Hiki ke hana hou i ke kaʻina hana kiʻekiʻe: Ma ka hāʻawi ʻana i kahi ʻano wela a paʻa mau, ʻae kā mākou poʻe susceptors i nā kaʻina hana hou. He mea nui kēia kūlike no ka hana nui ʻana o nā mea semiconductor hilinaʻi.

Ma Semixlab, ua paʻa mākou i ka hoʻolako ʻana i ka ʻoihana semiconductor me nā mea waiwai a me ka lawelawe Customization like ʻole. Hāʻawi mākou i ka hoʻolālā maʻamau a me ka hana ʻana no kā mākou SiC coated graphite susceptors. Hiki i kā mākou hui ʻenekinia ke hana pū me ʻoe e hana i kahi susceptor i kūpono loa i kāu mau kikoʻī lako a me nā koi kaʻina hana kūikawā.

hoakaka
Nā waiwai kino kumu o ka uhi CVD SiC
waiwai Typical Value
Hoʻomoe Crystal FCC β phase polycrystalline, ka mea nui (111).
nuʻa 3.21 Bi / cm³
paakiki 2500 Vickers paakiki(500g ukana)
Ka nui o ka palaoa 2 ~ 10μm
Maemae Kemika 99.99995%
Kaha wela 640 J·kg-1K-1
Mahana Sublimation 2700 ° C
Ka ikaika ikaika 415 MPa RT 4-point
ʻO Young's Modulus 430 Gpa 4pt piko, 1300 ℃
Mahana Conductivity 300W·m-1K-1
Hoʻonui wela (CTE) 4.5 × 10-6K-1
ko kakou Services

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