Waʻa wafer quartz semiconductor

ʻO nā waʻa wafer Semixlab Semiconductor Quartz nā mea hana nui i hoʻolālā ʻia no nā kaʻina hana wela e like me ka diffusion, oxidation, CVD, annealing, etc., i ka hana semiconductor. Hana ʻia me ka quartz synthetic maʻemaʻe kiʻekiʻe me ke kūpaʻa kiʻekiʻe kiʻekiʻe, ke kūpaʻa kemika a me ka coefficient hoʻonui haʻahaʻa haʻahaʻa, hiki iā ia ke lawe paʻa i nā wafers i nā kaʻina hana koʻikoʻi e hōʻoia i ka kūlike o ke kaʻina hana a me ka hua huahana.

Mea hoʻohana: E kūpono me nā ʻano like ʻole o ka Horizontal/Vertical Diffusion Furnace (Horizontal/Vertical Diffusion Furnace), ʻōnaehana LPCVD a me nā mea hana hoʻōla wela wikiwiki (RTP).

Ka hōʻoia maikaʻi

Ka mana o ka maikai: 100% helium mass spectrometry leak detection (leakage rate <1×10⁻⁹ mbar·L/s). Hoʻopuka ʻia ka hōʻike hoʻomaʻemaʻe waiwai (hōʻike ICP-MS) no kēlā me kēia pūʻulu.

Nā kūlana hōʻoia: Ma ka laina me nā kikoʻī SEMI F47, ma o ka ISO 9001: 2015 hōʻoia ʻōnaehana hoʻokele maikaʻi.

ʻO ke ola lawelawe: ʻoi aku ka nui o ke ola ma lalo o nā kūlana maʻamau ma mua o 2 mau makahiki (e pili ana i ke kaʻina hana a me nā kūlana wela).

No ke aha e koho ai i kā mākou moku quartz?

Nā lawelawe i hoʻonohonohoʻia: Ka nui a me ke kūkuluʻiaʻana e like me keʻano o nā mea hana (TEL, Kokusai, ASM, a me nā mea'ē aʻe) a me nā koi hana.

Pane wikiwiki: ʻO ka manawa hoʻopuka maʻamau he 3 mau pule, hiki ke hoʻemi ʻia nā kauoha wikiwiki i 10 mau lā hana.

Pūnaewele lawelawe honua: Hāʻawi i nā ʻōlelo aʻoaʻo ʻenehana, alakaʻi hoʻonohonoho a me ke kākoʻo mālama ma hope o ke kūʻai aku.

Kūlana papahana

Hoʻohui waiwai Fused Quartz

Maʻemaʻe ≥99.99% SiO₂

ʻO ka nui o ka wafer kūpono 8 ", 12" (hiki ke hana ʻia 6" a i ʻole 18")

ʻO ka mahana hana ≤1200°C (hoʻomau) / 1300°C (kiʻekiʻe)

Ka helu o ka hoʻonui wela (CTE) 0.55×10⁻⁶/°C (20-1000°C)

ʻO ka ʻeleʻele o ka ʻili (Ra) ≤0.2μm

Kapa maʻamau 25/50/100 papa

Nā kinoea kaʻina hana kūpono O₂, N₂, H₂, Ar, SiH₄, HCl, etc.

ʻO ka hoʻoheheʻe ʻana/diffusion kiʻekiʻe: doping silika (phosphorus, boron diffusion), ka ulu ʻana o ka ʻīpuka oxide.

Hoʻomoe kiʻiʻoniʻoni lahilahi: LPCVD polycrystalline silicon, Silicon nitride (Si₃N₄) deposition.

Kaʻina hana Annealing: annealing ma hope o ka hoʻokomo ʻana i ka ion (RTA), ka hoʻohuihui metala.

ʻEkolu hanauna semiconductor: silicon carbide (SiC), gallium nitride (GaN) epitaxy process.

1. Nā hiʻohiʻona waiwai

ʻO ka quartz maʻemaʻe kiʻekiʻe kiʻekiʻe (> 99.99% SiO₂): pale i ka haumia e nā ion metala (Na +, K +, Fe³ +, etc.) a hoʻokō i nā koi maʻemaʻe no nā kaʻina holomua (<5nm nodes).

Kūleʻa wela kiʻekiʻe: hoʻomau ʻia ka mahana hana o 1200 ° C, kū koke i ka mahana wela o 1300 ° C, ʻaʻohe deformation a i ʻole crystallization pilikia.

ʻAʻole inertness kemika: E pale i nā kinoea kaʻina hana e like me HCl, H₂, O₂, SiH₄ a me nā kaiapuni ʻakika/alkali. Non-corrosive i ka hoʻohana lōʻihi.

2. Hoʻolālā pololei

Hoʻonui i ka hoʻolālā:

ʻO ± 0.05mm ka pololei o ka spacing slot, e hōʻoia ana i ke kūlana wafer pololei (8/12 iniha) a me ka pale ʻana i nā ʻōpala a i ʻole ka neʻe ʻana.

ʻO ka hoʻolālā ʻana i ka haʻalulu wela, hoʻololi i ka piʻi wikiwiki a me ka hāʻule ʻana (ka wela wela ≤20°C/min).

ʻO ka hoʻokumu ʻana i nā ʻāpana haʻahaʻa: ʻO ka ʻili he ultra-precision polished (Ra ≤0.2μm) e hōʻemi i ka hoʻopili ʻana a hāʻule.

3. Hoʻonohonoho like ʻole

Hiki ke koho: Kākoʻo i nā ʻāpana 25, 50 mau ʻāpana, 100 mau ʻāpana a me nā kikoʻī maʻamau ʻē aʻe, hiki ke hana ʻia i ka helu slot maʻamau ʻole.

ʻAno hoʻololi: Waʻa Wehe, Waʻa Paʻa a i ʻole ʻano waʻa kūikawā (e like me ka hoʻolālā ʻana i ke kahawai hoʻoheheʻe ʻana i lalo o ka moku).

Q1: Hiki iā ʻoe ke hāʻawi i ka nui maʻamau a i ʻole ka hoʻolālā kūikawā?

A1: Kākoʻo ʻo Semixlab i nā lawelawe maʻamau, me ka hoʻoponopono ʻana i ka nui, ka palena kiʻekiʻe o ka mahana (pono ka hoʻomaikaʻi ʻana i nā mea) a i ʻole ke ʻano o ka interface. E ʻoluʻolu e kelepona i ka hui ʻenehana o Semixlab no nā koi kikoʻī.

Q2: Pehea ka lōʻihi o ka manawa alakaʻi?

A2: ʻO ka manawa hāʻawi no nā huahana maʻamau he 4-6 mau wiki, a ʻo ka hoʻolālā a me ka manawa hōʻoia no nā huahana maʻamau he 2-3 wiki.

Q3: Hāʻawi anei ʻoe i ke kākoʻo ʻenehana ma hope o ke kūʻai aku?

A3: ʻAe, hāʻawi mākou i ke kūkākūkā ʻenehana ola a me nā lawelawe pane pilikia. Inā pilikia ka hoʻouka ʻana a i ʻole ka hoʻohana ʻana, hiki ke hoʻopili ʻia ka hui kākoʻo i kēlā me kēia manawa ma ka leka uila a kelepona paha.

Q4: Ke kū nei ka huahana i nā kūlana semiconductor ʻoihana?

A4: ʻAe, hoʻokō ke kaʻina hana me nā kūlana SEMI a hōʻoia ʻia e ka ʻōnaehana hoʻokele maikaʻi ISO 9001. Hoʻāʻo ʻia kēlā me kēia pūʻulu no ka paʻa ʻana o ka ea, ka pale wela a me ka maʻemaʻe ma mua o ka haʻalele ʻana i ka hale hana.