All Māhele
Hōʻike
Nā Apo Sila Graphite Isostatic Maʻemaʻe Kiʻekiʻe
Nā apo sila ʻo Isostatic Graphite no Semiconductor
Nā Apo Sila Graphite Isostatic Maʻemaʻe Kiʻekiʻe
Nā apo sila ʻo Isostatic Graphite no Semiconductor

Nā Apo Sila Graphite Isostatic Maʻemaʻe Kiʻekiʻe


Ua hoʻolālā ʻia nā apo sila Isostatic Graphite High-Purity a Semixlab e kākoʻo i ka hana paʻa a me ka hoʻomalu ʻia o ka haumia o nā lako hana semiconductor holomua. Hana ʻia mai ka graphite i paʻi ʻia me ka isostatically ultra-high-purity, hāʻawi kēia mau apo sila i ka hana sila hilinaʻi i nā wahi wela kiʻekiʻe, vacuum kiʻekiʻe, a me nā ʻano kemika ikaika i loaʻa pinepine ʻia i nā kaʻina epitaxy, CVD / LPCVD / PECVD, diffusion, oxidation, RTP, a me nā kaʻina hana etch. Kōkua nā apo sila graphite a Semixlab i ka mālama ʻana i ke kūpaʻa o ke kaʻina hana, hoʻēmi i nā pilikia haumia o nā ʻāpana a me nā metala, a hoʻolōʻihi i nā pōʻaiapuni mālama lako. Hoʻokipa mākou i kāu mau nīnau.

Description

Hana ʻia nā apo sila Isostatic Graphite High-Purity mai Semixlab mai ka graphite i paʻi ʻia me ka isostatically ultra-high-purity, hāʻawi kēia mau apo sila i ka hana sila paʻa a haʻahaʻa ka haumia e kākoʻo pololei ana i ka hilinaʻi o ke kaʻina hana, ke kūlike o ka hua, a me ka manawa hana o nā lako ma nā kaʻina hana hana wafer mua kiʻekiʻe.

I loko o nā ʻōnaehana epitaxy, kahi e pono ai ka kaohi pololei ʻana o ke kahe kinoea, ke kūpaʻa o ke kaomi, a me ke ʻano like o ka thermal, he kuleana koʻikoʻi ko nā Semixlab's High-Purity Isostatic Graphite Sealing Rings i ka mālama ʻana i ka pono o ka reactor ma nā mahana i hoʻomau ʻia ma mua o 1000 °C. Hoʻokomo ʻia ma nā ʻaoʻao o ke keʻena, nā palena sila, a me nā hui wili a paʻa paha i loko o ka ʻāpana wela, hōʻike kēia mau apo sila i ka hoʻonui wela haʻahaʻa a isotropic, e ʻae ana iā lākou e mālama i ke kūpaʻa dimensional i ka wā o ka hoʻokele thermal hou. ʻO kā lākou ʻike haumia metala haʻahaʻa loa e hoʻemi i ka pilikia o ka hoʻokomo ʻana o ka dopant i manaʻo ʻole ʻia a i ʻole ka haumia metala, e kōkua ana i ka hōʻoia ʻana i ka mānoanoa like o ka papa epitaxial, nā ʻaoʻao doping i kāohi ʻia, a me ka ulu ʻana o ka crystalline kiʻekiʻe i nā kaʻina epitaxy silicon a me ka hui semiconductor.

Ma nā noi CVD, LPCVD, a me PECVD, ua hōʻike ʻia nā ʻāpana sila i ka hui pū ʻana o ke kiʻekiʻe o ka mahana, ka vacuum, nā kinoea precursor corrosive, a i kekahi mau hihia nā wahi plasma. Hoʻohana nui ʻia nā apo sila Isostatic Graphite High-Purity a Semixlab i nā sila puka keʻena, nā hale hoʻokaʻawale kinoea, a me nā wahi hoʻololi ma waena o nā wahi wela a me ke anu o ka reactor. ʻO ke kūpaʻa kemika kūloko o ka graphite maʻemaʻe kiʻekiʻe e hiki ai ke hana paʻa i ke alo o nā kinoea hana hoʻouka kaua e like me HCl, NH₃, a me nā precursors halogen-based, ʻoiai ʻo ka microstructure dense, isotropic e hōʻemi ana i ka hanauna ʻāpana a me ka hoʻohaʻahaʻa mechanical ma luna o ke ola lawelawe lōʻihi. Ke hoʻohālikelike ʻia me nā hoʻonā sila metala, hāʻawi nā apo sila graphite i ke kūpaʻa kiʻekiʻe i ka corrosion a me ka luhi thermal, e hāʻawi ana i nā wā mālama lōʻihi a me ka hoʻomaikaʻi ʻana i ka hana hou ʻana i ka hana nui.

ʻO ka hoʻolaha wela kiʻekiʻe, ka oxidation, a me ka hana wela wikiwiki e kau i nā koi koʻikoʻi ma ka hana sila ma muli o nā mahana koʻikoʻi, nā wikiwiki o ka ramp thermal, a me ke kaʻina hana pinepine. Ma kēia mau wahi, mālama nā Semixlab's High-Purity Isostatic Graphite Sealing Rings i ka pono o ke sila ʻana ma nā mahana ma mua o 1100 °C, e kākoʻo ana i ka mana lewa paʻa i loko o nā paipu umu a me nā keʻena RTP. ʻO nā waiwai mechanical like i hāʻawi ʻia e ka isostatic pressing e kōkua i ka pale ʻana i ka localized stress concentration, micro-cracking, a me ka sila distortion i ka wā hoʻomehana wikiwiki a me ka hoʻomaʻalili ʻana, a laila e hāʻawi ana i nā profiles diffusion dopant paʻa, ka ulu like o ka oxide, a me nā hopena hana thermal hana hou e koʻikoʻi no ka logic holomua a me ka hana ʻana o nā mea hoʻomanaʻo.

I ke kaʻina hana Etch, me nā noi etching maloʻo e hoʻohana ana i nā kemika halogen-based a me nā wahi i kōkua ʻia e ka plasma, pono nā apo sila e mālama i ka pono o ka vacuum me ka kaupalena ʻana i ka hanauna ʻāpana a me ka hoʻohaʻahaʻa kemika. Hoʻolaha pinepine ʻia nā apo sila Isostatic Graphite High-Purity a Semixlab ma nā wahi hōʻike plasma ʻaʻole pololei, e like me nā pilina sila periphery chamber a me nā wahi hoʻokaʻawale kūkulu. Ke hui pū ʻia me ka densification ʻili kūpono a i ʻole nā ​​​​uhi pale, hāʻawi kēia mau apo sila i ke kūpaʻa hilinaʻi i nā kinoea etch corrosive a me ke kaumaha thermal, e kākoʻo ana i nā kūlana keʻena paʻa a me ka hōʻemi ʻana i ka pilikia o ka nalowale o ka hua e pili ana i ka haumia.

Hana ʻia me ka nānā ʻana i ka maʻemaʻe o nā mea, ke kūpaʻa o ke kūkulu ʻana, a me ka hilinaʻi lōʻihi, ʻo ka kūlike o ka Semixlab's High-Purity Isostatic Graphite Sealing Ring me nā ʻenehana uhi holomua a me ka hoʻohui ʻana i nā ʻano hana semiconductor paʻakikī e hoʻolilo iā lākou i hopena hilinaʻi no nā kikowaena hana alakaʻi a me nā ʻōpeʻapeʻa. Ma ka hāʻawi ʻana i ka hana sila mau ma lalo o nā kūlana hana koi loa, kākoʻo ʻo Semixlab i nā mea hana semiconductor i ka hoʻokō ʻana i ka hua kiʻekiʻe, ka hoʻohana ʻana i nā lako i hoʻomaikaʻi ʻia, a me ka uku haʻahaʻa o ka loaʻa ʻana. Ke kakali nei mākou i ka lilo ʻana i hoa hana lōʻihi ma Kina.

hoakaka
Nā waiwai kino o ka graphite isostatic
waiwai Mokuna Typical Value
Ka nuʻu nui Bi / cm³ 1.83
paakiki HSD 58
Kūpaʻa uila μΩ.m 10
Ka ikaika ikaika MPa 47
Ka ikaika puʻuwai MPa 103
Kaha ikaika MPa 31
ʻO Young's Modulus GPa 11.8
Hoʻonui wela (CTE) 10-6K-1 4.6
Mahana Conductivity W·m-1·K-1 130
Ka nui o ka palaoa μm 8-10
ʻO Porosity % 10
ʻAoʻao lehu ppm ≤5 (ma hope o ka hoʻomaʻemaʻe ʻia)
ko kakou Services

Hale kūʻai huahana Semixlab

undefined

KA NUI

Māhele wela