Nā Apo Sila Graphite Isostatic Maʻemaʻe Kiʻekiʻe
Ua hoʻolālā ʻia nā apo sila Isostatic Graphite High-Purity a Semixlab e kākoʻo i ka hana paʻa a me ka hoʻomalu ʻia o ka haumia o nā lako hana semiconductor holomua. Hana ʻia mai ka graphite i paʻi ʻia me ka isostatically ultra-high-purity, hāʻawi kēia mau apo sila i ka hana sila hilinaʻi i nā wahi wela kiʻekiʻe, vacuum kiʻekiʻe, a me nā ʻano kemika ikaika i loaʻa pinepine ʻia i nā kaʻina epitaxy, CVD / LPCVD / PECVD, diffusion, oxidation, RTP, a me nā kaʻina hana etch. Kōkua nā apo sila graphite a Semixlab i ka mālama ʻana i ke kūpaʻa o ke kaʻina hana, hoʻēmi i nā pilikia haumia o nā ʻāpana a me nā metala, a hoʻolōʻihi i nā pōʻaiapuni mālama lako. Hoʻokipa mākou i kāu mau nīnau.
Description
Hana ʻia nā apo sila Isostatic Graphite High-Purity mai Semixlab mai ka graphite i paʻi ʻia me ka isostatically ultra-high-purity, hāʻawi kēia mau apo sila i ka hana sila paʻa a haʻahaʻa ka haumia e kākoʻo pololei ana i ka hilinaʻi o ke kaʻina hana, ke kūlike o ka hua, a me ka manawa hana o nā lako ma nā kaʻina hana hana wafer mua kiʻekiʻe.
I loko o nā ʻōnaehana epitaxy, kahi e pono ai ka kaohi pololei ʻana o ke kahe kinoea, ke kūpaʻa o ke kaomi, a me ke ʻano like o ka thermal, he kuleana koʻikoʻi ko nā Semixlab's High-Purity Isostatic Graphite Sealing Rings i ka mālama ʻana i ka pono o ka reactor ma nā mahana i hoʻomau ʻia ma mua o 1000 °C. Hoʻokomo ʻia ma nā ʻaoʻao o ke keʻena, nā palena sila, a me nā hui wili a paʻa paha i loko o ka ʻāpana wela, hōʻike kēia mau apo sila i ka hoʻonui wela haʻahaʻa a isotropic, e ʻae ana iā lākou e mālama i ke kūpaʻa dimensional i ka wā o ka hoʻokele thermal hou. ʻO kā lākou ʻike haumia metala haʻahaʻa loa e hoʻemi i ka pilikia o ka hoʻokomo ʻana o ka dopant i manaʻo ʻole ʻia a i ʻole ka haumia metala, e kōkua ana i ka hōʻoia ʻana i ka mānoanoa like o ka papa epitaxial, nā ʻaoʻao doping i kāohi ʻia, a me ka ulu ʻana o ka crystalline kiʻekiʻe i nā kaʻina epitaxy silicon a me ka hui semiconductor.
Ma nā noi CVD, LPCVD, a me PECVD, ua hōʻike ʻia nā ʻāpana sila i ka hui pū ʻana o ke kiʻekiʻe o ka mahana, ka vacuum, nā kinoea precursor corrosive, a i kekahi mau hihia nā wahi plasma. Hoʻohana nui ʻia nā apo sila Isostatic Graphite High-Purity a Semixlab i nā sila puka keʻena, nā hale hoʻokaʻawale kinoea, a me nā wahi hoʻololi ma waena o nā wahi wela a me ke anu o ka reactor. ʻO ke kūpaʻa kemika kūloko o ka graphite maʻemaʻe kiʻekiʻe e hiki ai ke hana paʻa i ke alo o nā kinoea hana hoʻouka kaua e like me HCl, NH₃, a me nā precursors halogen-based, ʻoiai ʻo ka microstructure dense, isotropic e hōʻemi ana i ka hanauna ʻāpana a me ka hoʻohaʻahaʻa mechanical ma luna o ke ola lawelawe lōʻihi. Ke hoʻohālikelike ʻia me nā hoʻonā sila metala, hāʻawi nā apo sila graphite i ke kūpaʻa kiʻekiʻe i ka corrosion a me ka luhi thermal, e hāʻawi ana i nā wā mālama lōʻihi a me ka hoʻomaikaʻi ʻana i ka hana hou ʻana i ka hana nui.
ʻO ka hoʻolaha wela kiʻekiʻe, ka oxidation, a me ka hana wela wikiwiki e kau i nā koi koʻikoʻi ma ka hana sila ma muli o nā mahana koʻikoʻi, nā wikiwiki o ka ramp thermal, a me ke kaʻina hana pinepine. Ma kēia mau wahi, mālama nā Semixlab's High-Purity Isostatic Graphite Sealing Rings i ka pono o ke sila ʻana ma nā mahana ma mua o 1100 °C, e kākoʻo ana i ka mana lewa paʻa i loko o nā paipu umu a me nā keʻena RTP. ʻO nā waiwai mechanical like i hāʻawi ʻia e ka isostatic pressing e kōkua i ka pale ʻana i ka localized stress concentration, micro-cracking, a me ka sila distortion i ka wā hoʻomehana wikiwiki a me ka hoʻomaʻalili ʻana, a laila e hāʻawi ana i nā profiles diffusion dopant paʻa, ka ulu like o ka oxide, a me nā hopena hana thermal hana hou e koʻikoʻi no ka logic holomua a me ka hana ʻana o nā mea hoʻomanaʻo.
I ke kaʻina hana Etch, me nā noi etching maloʻo e hoʻohana ana i nā kemika halogen-based a me nā wahi i kōkua ʻia e ka plasma, pono nā apo sila e mālama i ka pono o ka vacuum me ka kaupalena ʻana i ka hanauna ʻāpana a me ka hoʻohaʻahaʻa kemika. Hoʻolaha pinepine ʻia nā apo sila Isostatic Graphite High-Purity a Semixlab ma nā wahi hōʻike plasma ʻaʻole pololei, e like me nā pilina sila periphery chamber a me nā wahi hoʻokaʻawale kūkulu. Ke hui pū ʻia me ka densification ʻili kūpono a i ʻole nā uhi pale, hāʻawi kēia mau apo sila i ke kūpaʻa hilinaʻi i nā kinoea etch corrosive a me ke kaumaha thermal, e kākoʻo ana i nā kūlana keʻena paʻa a me ka hōʻemi ʻana i ka pilikia o ka nalowale o ka hua e pili ana i ka haumia.
Hana ʻia me ka nānā ʻana i ka maʻemaʻe o nā mea, ke kūpaʻa o ke kūkulu ʻana, a me ka hilinaʻi lōʻihi, ʻo ka kūlike o ka Semixlab's High-Purity Isostatic Graphite Sealing Ring me nā ʻenehana uhi holomua a me ka hoʻohui ʻana i nā ʻano hana semiconductor paʻakikī e hoʻolilo iā lākou i hopena hilinaʻi no nā kikowaena hana alakaʻi a me nā ʻōpeʻapeʻa. Ma ka hāʻawi ʻana i ka hana sila mau ma lalo o nā kūlana hana koi loa, kākoʻo ʻo Semixlab i nā mea hana semiconductor i ka hoʻokō ʻana i ka hua kiʻekiʻe, ka hoʻohana ʻana i nā lako i hoʻomaikaʻi ʻia, a me ka uku haʻahaʻa o ka loaʻa ʻana. Ke kakali nei mākou i ka lilo ʻana i hoa hana lōʻihi ma Kina.
hoakaka
| Nā waiwai kino o ka graphite isostatic | ||
| waiwai | Mokuna | Typical Value |
| Ka nuʻu nui | Bi / cm³ | 1.83 |
| paakiki | HSD | 58 |
| Kūpaʻa uila | μΩ.m | 10 |
| Ka ikaika ikaika | MPa | 47 |
| Ka ikaika puʻuwai | MPa | 103 |
| Kaha ikaika | MPa | 31 |
| ʻO Young's Modulus | GPa | 11.8 |
| Hoʻonui wela (CTE) | 10-6K-1 | 4.6 |
| Mahana Conductivity | W·m-1·K-1 | 130 |
| Ka nui o ka palaoa | μm | 8-10 |
| ʻO Porosity | % | 10 |
| ʻAoʻao lehu | ppm | ≤5 (ma hope o ka hoʻomaʻemaʻe ʻia) |
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