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ʻauʻau semiconductor quartz
Hoʻoponopono Kūmole:
1.Other inoa: Semiconductor quartz tank, quartz bath no semiconductor, quartz tank no semiconductor.
2.Application: ʻO ka Semiconductor Quartz Bath kahi mea hoʻomaʻemaʻe kiʻekiʻe, pale i ka corrosion i hoʻonohonoho pono ʻia no ka hoʻomaʻemaʻe pololei a me ka hana kemika i ka hana semiconductor. Hoʻolālā ʻia no ka hoʻohālikelike ʻana me ka ʻōnaehana WS-620C / WS-820C / WS-820L, e hana ana kēia ʻauʻau quartz ma lalo o nā kūlana wela kiʻekiʻe (a hiki i 175 ° C) a ua optimized no ka hoʻohana ʻana me ka phosphoric acid (H₃PO₄) solutions, e hōʻoia ana i ka hana ʻokoʻa i nā kaʻina hoʻomaʻemaʻe wafer koʻikoʻi.
3. Nā ʻāpana kumu:
ʻO ka quartz i hui pū ʻia (>99.99% SiO₂).
ʻO ka inertness kemika kūʻokoʻa i ka H₃PO₄ (ʻakika phosphoric) ma nā mahana kiʻekiʻe, e pale ana i ka hōʻino ʻana a i ʻole ka hana ʻana o nā ʻāpana.
Ke kū nei i ka hana mau ma 160 ° C a me nā wela kiʻekiʻe o 175 ° C, e mālama pono ana i ka hoʻolālā a me ke kūpaʻa dimensional.
Description
ʻO ka Semiconductor Quartz Bath kahi mea hoʻomaʻemaʻe kiʻekiʻe, pale i ka corrosion i hana ʻia no ka hoʻomaʻemaʻe pololei a me ka hana kemika i ka hana semiconductor. Hoʻolālā ʻia no ka hoʻohālikelike ʻana me ka ʻōnaehana WS-620C / WS-820C / WS-820L, e hana ana kēia ʻauʻau quartz ma lalo o nā kūlana wela kiʻekiʻe (a hiki i 175 ° C) a ua optimized no ka hoʻohana ʻana me ka phosphoric acid (H₃PO₄) solutions, e hōʻoia ana i ka hana ʻokoʻa i nā kaʻina hoʻomaʻemaʻe wafer koʻikoʻi.
Key Features
Mea Kiekie
Kiʻekiʻe-Maʻemaʻe Quartz: Hana ʻia mai ka synthetic fused quartz (> 99.99% SiO₂), e hōʻoia ana i ka liʻiliʻi o ka haumia a me ke kūʻē ʻana i ka haʻalulu wela.
Kūʻai ʻAka
ʻO ka inertness kemika kūʻokoʻa i ka H₃PO₄ (ʻakika phosphoric) ma nā mahana kiʻekiʻe, e pale ana i ka hōʻino ʻana a i ʻole ka hana ʻana o nā ʻāpana.
Kūpaʻa pumehana
Ke kū nei i ka hana mau ma 160 ° C a me nā wela kiʻekiʻe o 180 ° C, e mālama ana i ka kūpaʻa a me ke kūpaʻa dimensional.
Nā Pōmaikaʻi Hana
Ka hoʻomalu ʻana i ka hoʻohaumia ʻana: ʻO ka hoʻopau ʻana i ka ʻili maʻemaʻe loa e hōʻemi i ka hoʻopili ʻana i nā ʻāpana, koʻikoʻi no nā kaʻina node semiconductor sub-micron.
Ka lōʻihi: ʻO ke kū'ēʻana o Quartz i kaʻinoʻino a me ka wela wela e hoʻonui i ke ola o ka lawelawe, e ho'ēmi ana i ka manawa hoʻomaha a me nā koina mālama.
Ke Kaʻina Hana: Hoʻopaʻa ka hoʻoili wela wela i ka hāʻawi like ʻana i ka mahana, hoʻonui i ka hoʻomaʻemaʻe ʻana a me ka hana hou.
No ke aha e koho ai i ka Bath Semiconductor Quartz o Semixlab?
Semiconductor-Grade Quality: Hana ʻia i kahi lumi lumi maʻemaʻe e hoʻokō i nā kūlana SEMI.
Nā Hoʻoponopono Hoʻohālikelike: Loaʻa nā hoʻolālā maʻamau e kūlike i nā koi kaʻina hana.
Pono: ʻO ka hoʻāʻo maikaʻi ʻana e hōʻoia i ka hoʻokō ʻana i nā koi ʻoihana semiconductor.
hoakaka
| Waiwai mīkini | ʻO ka mānoanoa (g/cm3) | 2.2 |
| Mohs paʻakikī | 6-7 | |
| Ka ikaika compressive (MPa) | 1100 | |
| Ka ikaika uʻi (N/mm2) | 50 | |
| Ka ikaika wiliwili (N/mm2) | 65 | |
| Ka ikaika wiliwili (N/mm2) | 30 | |
| ʻO ka modulus opio (MPa) | 7.2x104 | |
| Lākiō a Poisson | 0.16 | |
| ʻO nā waiwai waiʻala | Coefficient o ka hoonui wela (20~320 ℃,k-1) | 5.5x10-7 |
| ʻO ke kau wela wela (20 ℃, W·m-1k-1) | 1.4 | |
| Mehana kikoʻī (20 ℃, J·kg-1k-1) | 670 | |
| Lae hooluolu (℃) | 1700 | |
| Lae hoʻohui (℃) | 1180 | |
| ʻO ke kiko kiko (℃) | 1080 | |
| Waiwai uila | ʻAiʻa uila (Ω·m) | 1x1016(20 ℃) |
| Mau dielectric (10GHz) | 3.74 | |
| Pohō dielectric (10GHz) | 0.0002 | |
| Ka ikaika dielectric (V·m-1) | 3.7x107 |
noi
Hoʻomaʻemaʻe Wafer: Wehe i ka photoresist, koena, a me nā mea hoʻohaumia i ka H₃PO₄ i hoʻokumu ʻia ma hope o ka etching a i ʻole lithography.
Nā Kaʻina Hana Kūlana Kiʻekiʻe: He kūpono no nā ʻanuʻu hana semiconductor kiʻekiʻe e koi ana i nā kemika koʻikoʻi ma nā wela kiʻekiʻe.
Hoʻohālikelike: He kūpono no ka ʻōnaehana WS-620C/ WS-820C/ WS-820L i nā mea hana e hana ana i ka loiloi, hoʻomanaʻo, a i ʻole nā mea mana.
